ELECTRON BEAM POSITIVE RESIST AND PRODUCTION OF PHOTOMASK USING THAT

摘要

PROBLEM TO BE SOLVED: To solve a problem of the trail of a chemically amplification positive resist pattern on a chromium oxide and to produce a high resolution photomask with a high throughput. SOLUTION: The resist compsn. described below is applied on a photomask substrate, irradiated with electron beams and baked. Then the substrate is developed with an alkali aq. soln. to obtain a pattern. The resist compsn. contains (a) an alkali soluble resin, (b) a compd. which produces an acid by irradiation of actinic rays, (c) a compd. derived from a polyhydroxy compd. having three or more benzene rings, three or more hydroxyl groups and two or less hydroxyl groups bonded to one benzene ring, in which hydrogen atoms in the hydroxyl groups are substituted with acid decomposable groups by 0.5 to 0.9 mol per hydrogen atom.