发明名称 METHOD AND APPARATUS FOR SUPPRESSING SEMICONDUCTOR TREATING GAS
摘要 <p>PROBLEM TO BE SOLVED: To improve a method and an apparatus for suppressing a spontaneously ignitable gas, to provide a certainty of an improved suppression and an improved efficiency and to remove fine particles from a suppressed container. SOLUTION: The method for suppressing one or more types of spontaneously ignitable gas in a gas. The method comprises the steps of introducing water into a gas flow, and/or mixing the gas flow with a preheated air, and introducing the gas flow into the container for suppressing the spontaneously ignitable gas.</p>
申请公布号 JP2001313263(A) 申请公布日期 2001.11.09
申请号 JP20010058327 申请日期 2001.03.02
申请人 BOC GROUP PLC:THE 发明人 SEELEY ANDREW JAMES;SMITH JAMES ROBERT
分类号 B01D53/34;B01D53/46;B01D53/68;B01D53/70;C23C16/44;H01L21/205;(IPC1-7):H01L21/205 主分类号 B01D53/34
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