发明名称 VAPOR PHASE GROWTH SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vapor phase growth system, which can instantaneously correct the pressure difference between a gas supply pipe and a send-out pipe caused, when a raw material line is switched, and so on, and can improve steepness of the interface between films formed in vapor phase growth. SOLUTION: This vapor phase growth system is instituted of, the gas supply pipe 10, which supplies a gaseous starting material from a gaseous starting material supply section 30 and a carrier gas from a carrier gas supply section 33 to a reaction tube 13 and the send-out pipe 20 which sends out the gaseous starting material from the gaseous starting material supplying section 30 and the carrier gas from the carrier gas supply section 33 to the outside of the reaction tube 13 communicate with each other on the upstream side (D) of the joint, between the pipes 20 and 10 with a gas switching section Vs which supplies the gaseous starting gas from the gaseous starting material supplying section 30 to the pipes 10 and 20 by switching.
申请公布号 JP2002016002(A) 申请公布日期 2002.01.18
申请号 JP20000194510 申请日期 2000.06.28
申请人 SONY CORP 发明人 TAKEYA MOTONOBU
分类号 C30B25/14;C23C16/455;H01L21/205;(IPC1-7):H01L21/205 主分类号 C30B25/14
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