| 摘要 |
The present invention provides a compact structure for the above-discussed SRAM cell as well as a method for fabricating the structure. The structure is preferably implemented in silicon. The standby power consumption of the cell is only approximately 0.5 nanowatts. The cell structure allows an SRAM cell to be fabricated in only a 16 feature-square area using planar technology. The structure of the cell according to one embodiment of the present invention is comprised of two bus bars of minimum feature size width, each of which has a tunnel diode implanted therein, and an elongated center land area (also of minimum feature size width) between the two bus bars. The transistor is constructed along the elongated center land area. In a preferred embodiment, transistors of neighboring cells share a common drain area and bit line contact. A corresponding method for fabricating the structure is also provided.
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