| 摘要 |
PROBLEM TO BE SOLVED: To obtain an exposing method capable of realizing half tone exposure for a pohotoresist at a low cost. SOLUTION: An exposing method for exposing a photoresist on a predetermined pattern by emitting a light 53 modulated by a spatial light modulator is provided. For example, an exposure range with exposure amount different in at least two stages is formed on the photoresist, by controlling the operation of the spatial light modulator, so that the emission frequency of the light 53 to the same part of the phororesist is changed accompanying sub-scanning. COPYRIGHT: (C)2005,JPO&NCIPI
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