| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for removing foreign materials stuck on the surface of a chuck while a vacuum state is maintained. <P>SOLUTION: As shown in Fig.(a), a vessel 7 for purge is mounted on a lifting table 5 instead of a reticle by a carrier robot not shown in the figure. Then, as shown in Fig.(b), the lifting table 5 is raised in a state that a reticle stage 1 has come to a chucking position to the position where a purge port 7a of the vessel 7 for purge is apart from the surface of an electrostatic chuck 2 by several millimeters. In this state, gas is blown off from the purge port 7a to gas-purge the surface of the electrostatic chuck 2, and the particles stuck on the surface of the electrostatic chuck 2 are blown off. The blown-off particles and the gas for purge are discharged to the outside of an exposure device by a vacuum pump vacuuming the exposure device. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
