| 摘要 |
A substrate processing apparatus, a method for modifying substrate processing conditions and a storage medium are provided to modify the processing conditions for the substrate whose process has been stopped, thereby performing a process on a substrate again whose process has been stopped in an optimal manner. A setting unit sets substrate processing conditions for a substrate(W) in a substrate processing unit processing the substrate. A detection unit detects an abnormality of the substrate processing unit while the substrate processing unit processes the substrate under the substrate processing conditions. A stopping unit stops the process of the substrate processing unit if the abnormality is detected. A modifying unit modifies the substrate processing conditions for a substrate on which the process is stopped by the stopping unit. The modifying unit modifies the substrate processing conditions by revising the substrate processing conditions.
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