PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of introducing a predetermined gas from e.g. a top plate side without generating abnormal plasma discharge.

SOLUTION: A plasma processing apparatus has: a processing vessel 34 that can be evacuated inside with a ceiling part open; a mounting platform 36 provided in the processing vessel to mount a workpiece W; a top plate 50 comprising a dielectric that is airtightly fitted to the opening of the ceiling part to transmit electromagnetic waves; an electromagnetic wave introducing means 54 introducing the electromagnetic waves for generating plasma into the processing vessel through the top plate; and a gas introducing means 52 introducing the predetermined gas into the processing vessel. In the plasma processing apparatus, the gas introducing means comprises: a gas injection hole 108 provided in the top plate to face into the processing vessel; a breathable porous dielectric 120 for hole that is provided in the gas injection hole; and a gas supply system 110 supplying the predetermined gas into the gas injection hole.

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