发明名称 REFERENCE PATTERN EXTRACTION METHOD, POSITIONING METHOD AND DEVICE, AND EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To extract a reference pattern from a part without any adhesion of dust, or the like. <P>SOLUTION: In a reference pattern extraction method, a reference pattern having a unique signal feature is extracted in a region to be measured having an area that is smaller than that of a prescribed region optionally set into the prescribed region on an object having a plurality of prescribed regions where essentially identical machining is made. The reference pattern extraction method comprises: a process S12 for measuring signal information at the region to be measured in a first prescribed region selected optionally from the plurality of prescribed regions; a process S17 for extracting a candidate pattern having a unique signal feature in the region to be measured, based on the signal information measured in the process; a process S22 for measuring the region to be measured in a second prescribed region differing from the first prescribed region in the plurality of prescribed regions; a process S23 for extracting a comparison pattern corresponding to the candidate pattern, based on the signal information measured in the process; and a process S25 for determining the aptitude of the candidate pattern as the reference pattern, based on the comparison pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007324160(A) 申请公布日期 2007.12.13
申请号 JP20060149237 申请日期 2006.05.30
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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