发明名称 INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an integrated circuit comprising a plurality of transistors, in which a high or a low threshold voltage exists in the same transistor substrate. SOLUTION: An integrated circuit includes a transistor of a first type with a first gate electrode and a transistor 183 of a second type with a second gate electrode 181. The first gate electrode is formed in a first gate groove that is defined in a semiconductor substrate, and the second gate electrode is formed inside a second gate groove 180 defined in the semiconductor substrate. The first gate electrode completely fills a space between two adjacent first isolation trenches, and the second gate electrode partially fills a space between two adjacent second isolation trenches, and substrate portions are arranged between the second gate electrode and the adjacent second isolation trenches, respectively. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008166786(A) 申请公布日期 2008.07.17
申请号 JP20070332359 申请日期 2007.12.25
申请人 QIMONDA AG 发明人 WANG PENG-FEI
分类号 H01L21/8234;H01L21/8242;H01L27/088;H01L27/108 主分类号 H01L21/8234
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