发明名称 EVALUATION METHOD FOR ANTI-PLASMA
摘要 An anti-plasma evaluation method is provided to maintain a constant plasma density in a chamber by controlling the power of the plasma generator based on the plasma density. A process of manufacturing a specimen is performed(P1). A withstand voltage of the manufactured specimen is measured by performing an initial withstand voltage measurement process(P2). An operation condition of the plasma generating chamber is set to an experiment environment(P3). The specimen is positioned on the set chamber. The anti-plasma experiment process is performed by exposing the specimen to the plasma(P4). The withstand voltage of the specimen is measured(P5). The measured second withstand voltage value is compared with the initial withstand measurement value(P6).
申请公布号 KR20090062886(A) 申请公布日期 2009.06.17
申请号 KR20070130359 申请日期 2007.12.13
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 YUN, JU YOUNG;KANG, SANG WOO;SEONG, DAE JIN;SIN, YONG HYEON
分类号 H01L21/205;H01L21/02 主分类号 H01L21/205
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