ATOMIC LAYER DEPOSITION APPARATUS

摘要

PURPOSE: An atomic layer deposition apparatus is provided to keep the temperature of a substrate and a susceptor constant by maintain the distance between susceptor and a heater constant and heating the substrate uniformly. CONSTITUTION: A susceptor(120) is installed in a process chamber(110) and mounts and rotates a plurality of the substrates(W). The susceptor includes a rotary shaft(121) which is installed in a lower part of the susceptor and lifts and rotates the susceptor. A heater(140) is installed in a lower part of the susceptor and heats the susceptor and the substrate. A heater lifting unit(141) lifts the heater while maintaining the distance between the susceptor and the heater constant when ascending and descending the susceptor.