| 发明名称 |
PHOTOMASK AND METHOD OF FORMING FINE PATTERN USING THE SAME |
| 摘要 |
A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough. |
| 申请公布号 |
US2016170295(A1) |
申请公布日期 |
2016.06.16 |
| 申请号 |
US201514671822 |
申请日期 |
2015.03.27 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
PARK Kwang Woo;WOO Jun Hyuk;KIM Jeong Won;SHIM Seung Bo;JU Jin Ho |
| 分类号 |
G03F1/38;G03F7/32;G03F7/36;G03F7/20 |
主分类号 |
G03F1/38 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photomask, comprising:
a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough, and the first and second filter layers at least partially overlap each other. |
| 地址 |
Yongin-City KR |
