发明名称 ELECTROLESS PLATING METHOD AND CERAMIC SUBSTRATE
摘要 Provided is an electroless plating method for a low temperature co-fired glass ceramic substrate, the method including: a degreasing and activation treatment step of degreasing and activating a surface of a wiring pattern formed of a silver sintered body; a catalyzing step of providing a catalyst onto the surface of the wiring pattern formed of a silver sintered body; and an electroless multi-layered coating plating treatment step. The electroless plating method further includes, between the degreasing and activation treatment step and the catalyzing step, a silver precipitation treatment step of precipitating silver on a glass component present on the surface of the wiring pattern formed of a silver sintered body after the degreasing and activation treatment step, and the catalyzing step includes providing the catalyst also to the silver precipitated in the silver precipitation treatment step.
申请公布号 HK1213301(A1) 申请公布日期 2016.06.30
申请号 HK20160101084 申请日期 2016.01.29
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 TAKEMOTO, YOHEI;SEKINO, SHIRO;KAIHATSU, YUTA;YAMANAKA, HIROMI
分类号 C23C 主分类号 C23C
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