ION SOURCE, ION BEAM DEVICE AND PROCESSING METHOD FOR SAMPLE

摘要

PROBLEM TO BE SOLVED: To provide an ion source that can be effectively used for both monomer ions and cluster ions.SOLUTION: An ion source 20 comprises a raw material gas introduction part 60 for introducing argon gas, a cluster generation chamber 30 which is connected to the raw material gas introduction part 60 and has a cluster generating mechanism (a nozzle 31 and the raw material gas introduction part 60) for generating cluster from argon gas, and a plasma generation chamber 40 which is connected to the raw material gas introduction part 60 and the cluster generation chamber 30 and has a plasma generating mechanism (an RF coil 43 and an RF power source 71) for generating plasma.SELECTED DRAWING: Figure 1