| 摘要 |
The present invention relates to an etching system for a glass substrate, and to an etching method using the same. The etching system effectively prevents contamination of an etchant during a repetitive etching process of glass substrates, and shortens an exchange period of the etchant. According to the present invention, the etching system for a glass substrate has a first assistant tank and a second assistant tank placed between a main tank and a filter press. A contaminated etchant stored in the main tank is supplied to the first assistant tank. The contaminated etchant stored in the first assistant tank is filtered through the filter press to have impurities removed. A cleaned etchant is stored in the second assistant tank, and the cleaned etchant stored in the second assistant tank is supplied to the main tank. |
