| 摘要 |
<p>A position detection method, an exposure apparatus, and a device manufacturing method thereof are provided to improve alignment accuracy because the measured value of an alignment mark is not changed even in case the focus position is changed in alignment. A position detection method of the focus position comprises following steps. The relation between the position of an object in the optical axial of an optical system and an evaluation value of an output signal of an image pickup device is measured. In case the evaluation value has a plurality of peaks, a peak which is near to the standards focus position is selected and the position of the selected peak is detected as the focus position(S105). In case the selection of the peak which is near to the standards focus position fails, the standard focus position is detected as the focus position(S106). The standard focus position is the peak position of the evaluation value of the output signal of the image pickup device under lighting condition that single peak is generated as to evaluation value.</p> |
