HALF-TONE PHASE SHIFT BLANKMASK, PHOTOMASK AND IT'S MANUFACTURING METHOD

摘要

A half-tone phase shift blank mask, photomask and its manufacturing method are provided to improve the density and line edge roughness of the thin film by using the DC-RF coupled sputtering method. The phase shift layer is formed on the transparent substrate(10). The phase shift layer consists of multilayer more than the single layer or two layers. The light-shielding layer(50) is formed on the phase shift layer. The reflection barrier layer(60) is formed on the light-shielding layer. The resist film is formed on the reflection barrier layer. The target for the single layer phase shift layer is made of metal more than one kind and/or the transition metal. The first phase inversion film(20) includes tantalum(Ta) and/or chrome(Cr). The first phase inversion film is formed at the upper part of the transparent substrate.