发明名称 Verfahren zur Herstellung diffundierter UEbergaenge in Halbleitern
摘要 1,183,977. Semi-conductor device. PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd. 20 June, 1967 [21 June, 1966], No. 28326/67. Heading H1K. A radiation-sensitive semi-conductor target plate comprises a single-crystal semi-conductor body of one conductivity type having a surface zone 150 Š thick or less of the opposite conductivity type formed by diffusion of a dopant. The preferred depth of diffusion is 100 Š or in the case of silicon not more than ten times the lattice constant. The dopant is preferably boron. The transverse resistance of the surface layer is such that grooves are not required to form separate junctions.
申请公布号 DE1619984(A1) 申请公布日期 1971.07.08
申请号 DE19671619984 申请日期 1967.06.20
申请人 N.V. PHILIPS' GLOEILAMPENFABRIEKEN 发明人 LE COQ,DANIEL
分类号 H01J29/45;H01L21/00;H01L21/22;H01L29/00;H01L31/08;H01L31/18 主分类号 H01J29/45
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