| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new support head for a chemical mechanical polishing apparatus. <P>SOLUTION: A support head 100 includes a housing 102, a base 104, a load mechanism 108, a gimbal mechanism 106 and a substrate-backing assembly 112. The substrate backing assembly includes a support structure 114 disposed under the base, a ring flexure 116 which is substantially horizontal for coupling the support structure to the base, and a flexible membrane 118 which is to be coupled to the support structure. The flexible membrane has an attachment surface 274 for the substrate and extends directly beneath the base, to form a chamber 290. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
