| 摘要 |
PURPOSE:To prevent deterioration of the characteristic of the surface of a photoconductive layer by a method wherein a transparent and protective layer is adhered on the photoconductive layer without making to come in contact with the atmosphere in a device the same with the device wherein the photoconductive layer is made to grow on an insulative substrate. CONSTITUTION:A photoconductive layer 602 consisting of amorphous silicon, etc., is made to grow on an insulative substrate 601, a transparent and protective layer 603 consisting of SiO2+Si3N4, etc., is adhered in succession on the whole upper face thereof in the same device without making to come in contact with the atmosphere, the photoconductive layer 602 and the transparent and protective layer 603 at the part other than the part to detect deflected light from a manuscript are removed, and after then a photo resist 604 is applied on the whole surface for formation of an electrode. Then the transparent and protective layer at the electrode contact part is removed selectively, and the transparent and protective layers 603a, 603b are formed. Metal films 605a-605c of Al, etc., are adhered on the upper faces. Then the removal process of the resists 604a, 604b is performed. |
