发明名称 Projection exposure device and position alignment device and position alignment method
摘要 A mask mark is irradiated by an ultra-violet light source, thereby the image of the mark is passed through a lens and a half-mirror, then reflected by a mirror, thereafter further passed through a beam splitter and a lens, forming an image on a CCD. Then the center coordinate of the image is measured by a device, next, a board mark is illuminated by an infrared light source, and its image is passed through the mirror, the half-mirror, the beam splitter, a reflector, a lens, and a beam splitter, forming an image on a CCD. The positional alignment is implemented by moving the mobile stage in the XYtheta directions based on the board mark on the infrared CCD and the mask mark on the ultra-violet CCD.
申请公布号 US6927854(B2) 申请公布日期 2005.08.09
申请号 US20030414966 申请日期 2003.04.16
申请人 ADTEC ENGINEERING CO., LTD. 发明人 HIRABAYASHI YOUICHI;MATSUMOTO NORIYOSHI
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G01B11/00;G03B27/42;G03B27/32;G06K9/00 主分类号 G01B11/00
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