发明名称 SHEET TYPE ANNEALING APPARATUS
摘要 PURPOSE:To enable to perform annealing process doing no damage to a substrate at all due to difference in temperature by a method wherein a substrate is annealed as it is held by a ring which is held by specimen holding quartz bars in an annealing vessel. CONSTITUTION:An annealing vessel 1 is provided with quartz-made holding bars 2 around 2mm in diameter to hold a ring 3. The diameter of holding bars 2 is made small enough actually coming into point contact with the ring 3 so that the thermal capacity of holding bars 2 may have no effect on the temperature A of ring 3 at all due to the contact with ring 3. Next a tungsten halogen lamp is used as a heating light source while the light emitted from the lamp is not absorbed into the quartz-made annealing vessel 1 but to be absorbed into the silicon-made ring 3 and a silicon-made substrate 4. In such a constitution, the temperature distribution B may be made even within the silicon substrate 4 and a part of the ring 3 although the temperature may become lower than that in the central part within the range around 5-10mm distant from the outer diameter end of ring 3.
申请公布号 JPS61206232(A) 申请公布日期 1986.09.12
申请号 JP19850046525 申请日期 1985.03.11
申请人 HITACHI LTD 发明人 OOYU SHIZUNORI;KASHU NOBUYOSHI;SUZUKI TADASHI;WADA YASUO
分类号 H01L21/683;H01L21/268;H01L21/324;H01L21/67 主分类号 H01L21/683
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