发明名称 |
SHEET TYPE ANNEALING APPARATUS |
摘要 |
PURPOSE:To enable to perform annealing process doing no damage to a substrate at all due to difference in temperature by a method wherein a substrate is annealed as it is held by a ring which is held by specimen holding quartz bars in an annealing vessel. CONSTITUTION:An annealing vessel 1 is provided with quartz-made holding bars 2 around 2mm in diameter to hold a ring 3. The diameter of holding bars 2 is made small enough actually coming into point contact with the ring 3 so that the thermal capacity of holding bars 2 may have no effect on the temperature A of ring 3 at all due to the contact with ring 3. Next a tungsten halogen lamp is used as a heating light source while the light emitted from the lamp is not absorbed into the quartz-made annealing vessel 1 but to be absorbed into the silicon-made ring 3 and a silicon-made substrate 4. In such a constitution, the temperature distribution B may be made even within the silicon substrate 4 and a part of the ring 3 although the temperature may become lower than that in the central part within the range around 5-10mm distant from the outer diameter end of ring 3. |
申请公布号 |
JPS61206232(A) |
申请公布日期 |
1986.09.12 |
申请号 |
JP19850046525 |
申请日期 |
1985.03.11 |
申请人 |
HITACHI LTD |
发明人 |
OOYU SHIZUNORI;KASHU NOBUYOSHI;SUZUKI TADASHI;WADA YASUO |
分类号 |
H01L21/683;H01L21/268;H01L21/324;H01L21/67 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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