发明名称 |
PROCESS FOR THE PROTECTION OF A DIAPHRAGM DURING THE GENERATION OF ELECTRON BEAM PULSES |
摘要 |
The invention relates to a process for the protection of a diaphragm during the generation of electron-beam pulses by means of alternately deflecting the electron beam onto the diaphragm and onto a processing site. In order to prevent damage to the diaphragm from the thermal effect of the electron beam, the electron beam is distributed with respect to space and/or time over an enlarged striking surface.
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申请公布号 |
US5118949(A) |
申请公布日期 |
1992.06.02 |
申请号 |
US19900603460 |
申请日期 |
1990.10.25 |
申请人 |
MESSER GRIESHEIM |
发明人 |
RAPPAT, FRANZ J.;SCHEFFELS, WILHELM;SCHWAB, ULRICH |
分类号 |
G02B5/00;H01J37/09;H01J37/147;H01J37/30 |
主分类号 |
G02B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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