发明名称 NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To form a pattern having a high aspect ratio and a satisfactory shape even when the film thickness is increased by incorporating an alkali-soluble resin, a crosslinking agent capable of crosslinking the alkali-soluble resin by the action of an acid and a specified compd. CONSTITUTION:An alkali-soluble resin, a crosslinking agent capable of crosslinking the alkali-soluble resin by the action of an acid and a compd. represented by the formula and generating the acid under light are incorporated. In the formula, each of R<1> and R<2> is H or alkyl, each of R<3>-R<7> is H, alkyl or alkoxy but R<4> and R<6> are not simultaneously alkoxy, and each of R<8> and R<9> is H or haloalkyl but R<8> and R<9> are not simultaneously H. The alkali-soluble resin is not especially limited if the unexposed part of the resin is alkali-soluble at the time of development and is leached in an alkali developer but novolak resin or polyvinyl phenol is preferably used.
申请公布号 JPH07128855(A) 申请公布日期 1995.05.19
申请号 JP19940122654 申请日期 1994.06.03
申请人 MITSUBISHI CHEM CORP 发明人 OCHIAI TAMEICHI;TAKASAKI RYUICHIRO;KAMEYAMA YASUHIRO;TAKAHASHI SHICHIRO
分类号 G03F7/004;G03F7/029;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 主分类号 G03F7/004
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