EXPOSURE DEVICE FOR WAFER,申请号KR19950046673-传众专利搜索

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发明名称	EXPOSURE DEVICE FOR WAFER
摘要
申请公布号	KR0152926(B1)	申请公布日期	1998.10.01
申请号	KR19950046673	申请日期	1995.12.05
申请人	LG SEMICONDUCTOR CO.,LTD	发明人	AHN, BYUNG-JOON
分类号	G03F7/20;H01L21/027;(IPC1-7):G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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