| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wet deposition process such as misted chemical deposition with a shutter driven in one axis direction in order to produce a thin film or powder array various in composition on a wafer or in a reactor having apertures as many as the number of samples to be produced. <P>SOLUTION: A material having various compositions is transferred to an area predetermined by means of a mask on the wafer to form an array having minimum 16 to about 20,000 different compositions by mixture or reaction of at least two materials to a minimum in a liquid state. By the process, it is possible to develop materials for various use, e.g., ferroelectrics and inorganic material including fluorescencers, organic polymers, organic metals, ionic solids and metal alloys, more efficiently than by the current experiment. Also provided is a method of characteristic analysis of the above array within a short time, in addition to development of the array having the above various compositions. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
