| 摘要 |
A cleaning apparatus, a cleaning method, and a computer readable medium are provided to sufficiently clean the surroundings of a liquid ejection hole by forming a liquid layer around the liquid ejection hole. A substrate maintaining unit(2) includes a rotational plate and a maintaining member for horizontally maintaining a substrate. A rotating unit(3) rotates the rotational plate together with the substrate. A liquid ejection hole(5) is located near the revolution center of the rotational plate and ejects a liquid to the center of the substrate maintained by the substrate maintaining unit. A rear-side liquid supply nozzle(6) supplies a cleaning liquid and a rinse liquid so as to eject them to a rear of the substrate through the liquid ejection hole. A cup(4) surround the substrate maintained by the substrate maintaining unit. A control unit controls the revolution of the substrate and the liquid supply. The control unit forms a liquid layer at the surroundings of the liquid ejection hole to process the substrate and the surroundings.
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