| 摘要 |
A diffusion flange is provided to collect the dust by falling the dust through an ultrasonic oscillator after gathering the dust by a discharge plate and a dust catcher. An inlet(111) is formed in an upper part of the diffusion flange. An upper fastening part(110) connected to a vacuum chamber for manufacturing the semiconductor is coupled in the inlet. An outlet(121) is formed in the lower part of the diffusion flange. A lower fastening part(120) connected to the vacuum pump is formed in the outlet. A diffusion flange includes a discharge plate(130), a dust catcher(140), a dust capturing film(160), and an ultrasonic oscillator. The discharge plate is mounted on the internal upper part of the diffusion flange in a traverse direction.
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