| 摘要 |
PURPOSE: A method for processing a substrate is provided to remove deionized water and moisture as well as pollutants and particles from a surface of a substrate. CONSTITUTION: A liquid reaction container(10) is filled with deionized water by a deionized water supply/discharge unit(11). The deionized water is discharged to a pocket(13). A plurality of substrates(100) are loaded by an up-down unit(30). The substrates(100) are soaked in the deionized water by the up-down unit(30). A gas reaction container(20) is transferred from a loading/unloading stage(50) to the liquid reaction container(10) by a transfer robot unit(40). A dry gas and a carrier gas are supplied to the gas reaction container(20) through a gas supply unit(21). Pollutants and particles are removed from surfaces of the substrates(100) by the deionized water. A dry process is performed. The substrates(100) are transferred to the loading/unloading stage(50).
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