发明名称 High frequency cathode vapour-coating - device
摘要 Cathode vapour-coating device, particularly for silicon coatings on semi-conductors, comprises an electrode with vaporisation material inside on electrically non-conductive vacuum chamber. The counter electrode is in the of a boad ring around the outside of the vacuum chamber. Specifically the wall of this chamber is of glass or ceramic material.
申请公布号 DE1928550(A1) 申请公布日期 1970.12.10
申请号 DE19691928550 申请日期 1969.06.04
申请人 SIEMENS AG 发明人 HELMOLD KAUSCHE,DIPL.-PHYS.
分类号 C23C14/34;H01J37/34 主分类号 C23C14/34
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