| 摘要 |
PROBLEM TO BE SOLVED: To provide a catadioptoric projection optical system which is constituted by using no beam splitter and a reflection system and a refraction system and has a large numerical aperture. SOLUTION: This projection optical system is equipped with 1st partial imaging optical systems (G1 , G2 ) which form intermediate images of the pattern of a mask (21) and a 2nd partial imaging optical system (G3 ) which forms an image of the intermediate image on a substrate (25), and the 1st partial imaging optical systems (G1 , G2 ) are equipped with a 1st convergence group (G1 ) which converges the luminous flux from the pattern, a selection optical member (M1 ) which guides the luminous flux from the 1st convergence group (G1 ) to a trailing optical system by bending the luminous flux to a direction different from the optical axis direction of the 1st convergence group (G1 ), and a 2nd convergence group (G2 ) which forms an intermediate image of the pattern by reflecting the luminous flux from the selection optical member (M1 ), which is arranged in the optical path between the 1st convergence group (G1 ) and 2nd convergence group (G2 ) and in the optical path between the 1st partial imaging optical systems (G1 , G2 ) and 2nd partial imaging optical system (G3 ). |
