| 摘要 |
PURPOSE:To reduce the tact time of an apparatus and improve productivity by eliminating alignment time for exposure after 2nd shot. CONSTITUTION:When the exposure of 1st shot is performed, at first a mask 1 is aligned with mask reference marks 17 on an apparatus side by a microscope 19. After that, the alignment marks of the mask 1 and the alignment marks of a substrate 3 formed in a previous process are measured by the microscope 19 to align the mask 1 and the substrate 3 and the exposure of the 1st shot is performed. When the exposure of 2nd shot is performed, the substrate 3 is transferred step by step accurately so as to be set at the predetermined position while the position of the substrate 3 is being measured by a laser interferometer 14 and a scourer 15 provided on a stage. |
