| 摘要 |
In order to provide a projection exposure apparatus capable of obtaining high optical quality in manufacturing devices with a light source using a vacuum ultraviolet light, a diffraction optical element formed on a substrate made from silica glass with a small amount of another substance (such as, for example, fluorine, hydroxyl radical, hydrogen, and/or combinations thereof), is included in the projection optical system and/or the illumination optical system of the exposure apparatus.
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