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发明名称
CLEANING BRUSH FOR SEMICONDUCTOR WAFER
摘要
<p>A brush for cleaning the surface of a circular wafer. The brush continuously covers about 45 % of the surface area of the wafer and utilizes the weight of the brush to adjust the pressure applied by the brush against the wafer surface.</p>
申请公布号
WO1992016965(A1)
申请公布日期
1992.10.01
申请号
US1992002331
申请日期
1992.03.24
申请人
发明人
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主分类号
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