PRODUCTION OF LEAD TITANATE THIN FILM

摘要

PURPOSE: To produce a lead titanate thin film oriented in C axis, exhibiting excellent piezoelectric characteristics at a low production temperature independent of the kind of the substrate by forming a perovskite-type oxide thin film while sputtering a compound containing lead and titanium to an objective substrate. CONSTITUTION: A high-density oxygen plasma generated by electron cyclotron resonance is applied to a target substrate while sputtering a compound containing lead and titanium to the target substrate by using a target consisting of a lead-containing metal or compound and a titanium-containing metal or compound to obtain the objective thin film consisting of a perovskite-type oxide thin film. The pressure for maintaining the plasma is 1.0×10<-5> to 1.0×10<-2> Torr because the film-forming speed becomes excessively slow for practical use under a pressure of <=1.0×10<-5> Torr and the plasma is not effective under a pressure of >=1×10<-2> Torr.