发明名称 CLEANSING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a cleansing composition, exhibiting high performance for removing well-keeping make-up cosmetics, and, at the same time, giving clean feeling during and after cleansing. SOLUTION: This cleansing composition contains the following components A, B, C and D: (A) 1 to 30 wt.% an anionic surfactant, (B) 1 to 15 wt.% a silicone-based surfactant having an HLB level of 5 to 12, (C) 5 to 50 wt.% silicone oil, and (D) 10 to 90 wt.% water. It is preferable that the silicone oil is volatile, and anionic surfactant is based on carboxylic acid-based one.
申请公布号 JP2000336014(A) 申请公布日期 2000.12.05
申请号 JP19990147432 申请日期 1999.05.27
申请人 SHISEIDO CO LTD 发明人 KIMURA TOMOHIKO;NODA AKIRA
分类号 A61K8/00;A61K8/89;A61K8/891;A61Q1/02;A61Q1/14;C08L83/04;(IPC1-7):A61K7/02 主分类号 A61K8/00
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