Cleaning sheet and method of cleaning a substrate

摘要

A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions of CH 3 Si + , C 3 H 9 Si + , C 5 H 15 Si 2 O + , C 5 H 15 Si 3 O 3 + , C 7 H 21 Si 3 O 2 + , CH 3 SiO - , CH 3 SiO 2 - and Si + in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C 2 H 3 + in the case of positive ion or O - in the case of negative ion.