发明名称 Semiconductor device, and a method for manufacturing the same
摘要 A thin film transistor of the present invention has an active layer including at least source, drain and channel regions formed on an insulating surface. A high resistivity region is formed between the channel region and each of the source and drain regions. A film capable of trapping positive charges therein is provided on at least the high resistivity region so that N-type conductivity is induced in the high resistivity region. Accordingly, the reliability of N-channel type TFT against hot electrons can be improved.
申请公布号 US2005040476(A1) 申请公布日期 2005.02.24
申请号 US20040935177 申请日期 2004.09.08
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TAKEMURA YASUHIKO;TERAMOTO SATOSHI
分类号 H01L21/336;H01L21/77;H01L21/84;H01L27/13;H01L29/786;(IPC1-7):H01L29/04 主分类号 H01L21/336
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