PLASMA APPARATUS AND METHOD FOR MANUFACTURING SHIELDING PLATE THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for keeping high inductive coupling between a coil and plasma and lowering contaminants spattered from an insulating window. SOLUTION: This apparatus for generating high density plasma is provided with a process chamber having an insulating window positioned in a single plane, a coil 44 installed adjacently to the insulating window outside the process chamber and practically parallel to the single plane and a shielding plate 60 positioned between the coil 44 and the insulating window. The shielding plate 60 has a large number of openings and the openings are positioned between adjacent turns of the coil 44. Consequently, the yield of a semiconductor wafer is improved and the production cost is lowered.