| 摘要 |
PROBLEM TO BE SOLVED: To provide an antireflection film which is excellent not only in reflection preventive effect but also in adhesive strength of an antireflection layer to a substrate and durability thereof. SOLUTION: This antireflection film is formed by successively laminating a hard coating layer, a primer layer and the antireflection layer in this order on the transparent substrate, where the primer layer is a silica film having organic groups which are formed by plasma CVD method by using an organic silicon compound as starting material. The organic silicon compound is at least one kind selected from monoalkyl-hexaalkyl disiloxane, where the number of carbon in the alkyl group is 1-3. |
