POLISHING DEVICE AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To obtain high degree of flatness and stable management of film thickness by performing polishing after dressing stably. SOLUTION: In a polishing device provided with a top ring device polishing by bringing a face to be polished of a material to be polished into contact with a polishing tool face on a turn table and a dressing device 22 dressing by bringing a dressing member into contact with the polishing tool face, a temperature controller 23 controlling a temperature of the dressing member in advance and/or during dressing is provided.