| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing solution for metal which comprises colloidal silica whose surface is partially covered with aluminum atom as a solid abrasive grain and can restrain residual of the solid abrasive grain on a polishing surface after polishing. <P>SOLUTION: The polishing solution comprises (a) colloidal silica whose surface is partially covered with aluminum atom, (b) organic acid, (c) passive film forming agent, and (d) at least one kind selected from cationic surfactant, nonionic surfactant and water soluble polymer. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
