发明名称 MASTER OPTICAL DISK EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To highly accurately expose the groove space of a master optical disk. <P>SOLUTION: The master optical disk exposure device for mounting a master optical disk 2 on a turntable 3 supported on a moving stage 5, applying an exposure beam 1 to the master optical disk 2, and spirally recording predetermined information in the master optical disk 2 is provided with a linear encoder 15 for detecting the moving position of the moving stage 5 to output a moving position signal, a rotary encoder 15 for detecting the rotary angle of the turntable 3 to output a rotary angle position signal, a track groove space deviation calculation device 21 for calculating the deviation amount of a groove space between adjacent tracks based on the moving position signal and the rotary angle position signal, and a deflector 12 for adjusting the application position of the exposure beam 1 applied to the master optical disk 2 based on the deviation amount from the device 21. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007242184(A) 申请公布日期 2007.09.20
申请号 JP20060065813 申请日期 2006.03.10
申请人 RICOH CO LTD 发明人 ENDO HIDEYASU
分类号 G11B7/26;G03F7/20 主分类号 G11B7/26
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