| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a surface inspection device which enables inexpensive inspection at a high throughput. <P>SOLUTION: The surface inspection device 1 is equipped with an illumination optical system 30 for irradiating the surface of a water 10, which has a repeated pattern, with a linearly polarized light L1, an alignment stage 20 for holding the wafer 10, an imaging optical system 40 for capturing the image of the reflected light from the surface of the wafer 10; an image memory part 51 for storing the image captured by the imaging optical system 40; an image processing part 52 for applying predetermined image processing to the image stored in the image memory part 51, to detect the flaw of the repeated pattern and an image output part 53 for outputting the result of the imaging processing due to the image processing part 52. The azimuth of the transmission axis of a second polarizing plate 43 is set so as to be inclined by 45°, with respect to the transmission axis of a first polarizing plate 32. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
