发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To drive a stage with high accuracy.SOLUTION: At exposure, positional information of a stage WST is measured by a Y head 64 and an X-head 66 which are respectively opposing to Y scales 39Yand 39Y, and X scales 39Xand 39X. Movement of the stage WST is controlled while a measurement error (Abbe error) of an encoder system generated due to a difference (Abbe deviation amount) in height of a surface of each scale with respect to a reference plane of the stage WST is being compensated based on measurement information on the encoder system including the heads 64 and 66.SELECTED DRAWING: Figure 3
申请公布号 JP2016114951(A) 申请公布日期 2016.06.23
申请号 JP20160004105 申请日期 2016.01.13
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 G03F7/20;G01B11/00;H01L21/68 主分类号 G03F7/20
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