发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor device includes a first substrate, a second substrate, a plurality of through vias (TVs), and a plurality of conductive caps. The first substrate includes at least one electric component arranged thereon. The second substrate is stacked on the first substrate. The TVs penetrate the second substrate and is extended to be electrically connected to the at least one electric component of the first substrate. The conductive caps cover the TVs, respectively. The conductive caps are electrically insulated from each other. So, a short circuit can be prevented when a dielectric layer is damaged.
申请公布号 KR20160081776(A) 申请公布日期 2016.07.08
申请号 KR20150142672 申请日期 2015.10.13
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHENG YUN WEI;CHOU CHUN HAO;LEE KUO CHENG;HUNG FENG CHI;HSU YUNG LUNG
分类号 H01L21/768;H01L21/8238;H01L27/108 主分类号 H01L21/768
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