发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which sufficiently inhibits reverse leakage current while allowing options of materials of a Schottky electrode and an insulation film to be broadened.SOLUTION: A semiconductor device comprises: a semiconductor layer which has a mesa structure forming a tableland shape having an upper surface and a side surface, and a peripheral surface prevailing around the mesa structure; a Schottky electrode which forms Schottky junction with the upper surface; an insulation film which is formed from the peripheral surface across the side surface to a surface of the Schottky electrode and has an opening on the Schottky electrode; and a wiring electrode which is electrically connected with the Schottky electrode inside the opening and which is formed from the inside of the opening across a portion formed on the side surface out of portions of the insulation film to a surface of a portion formed on the peripheral surface out of the portions of the insulation film.SELECTED DRAWING: Figure 1
申请公布号 JP2016162785(A) 申请公布日期 2016.09.05
申请号 JP20150037508 申请日期 2015.02.27
申请人 TOYODA GOSEI CO LTD 发明人 HASEGAWA KAZUYA;OKA TORU;TANAKA SHIGEAKI
分类号 H01L29/872;H01L21/28;H01L21/329;H01L29/06;H01L29/41;H01L29/47 主分类号 H01L29/872
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