发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which sufficiently inhibits reverse leakage current while allowing options of materials of a Schottky electrode and an insulation film to be broadened.SOLUTION: A semiconductor device comprises: a semiconductor layer which has a mesa structure forming a tableland shape having an upper surface and a side surface, and a peripheral surface prevailing around the mesa structure; a Schottky electrode which forms Schottky junction with the upper surface; an insulation film which is formed from the peripheral surface across the side surface to a surface of the Schottky electrode and has an opening on the Schottky electrode; and a wiring electrode which is electrically connected with the Schottky electrode inside the opening and which is formed from the inside of the opening across a portion formed on the side surface out of portions of the insulation film to a surface of a portion formed on the peripheral surface out of the portions of the insulation film.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016162785(A) |
申请公布日期 |
2016.09.05 |
申请号 |
JP20150037508 |
申请日期 |
2015.02.27 |
申请人 |
TOYODA GOSEI CO LTD |
发明人 |
HASEGAWA KAZUYA;OKA TORU;TANAKA SHIGEAKI |
分类号 |
H01L29/872;H01L21/28;H01L21/329;H01L29/06;H01L29/41;H01L29/47 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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