发明名称 METHOD AND APPARATUS FOR INSPECTING DEFECT OF PATTERN
摘要 <p>PURPOSE:To facilitate data collection for inspection by providing a comparison means through which picture signals from first and second picture forming means are compared mutually while relatively moving a sample base and a defect is inspected. CONSTITUTION:An image by the design data of a memory cell 50 inputted to a comparator 41 and an image by an actual pattern enclosed to a pattern image buffer memory 42 obtained through a light-receiving element 32 are compared, and the presence of a defect is verified. Video signal processors 34, 35 and the comparator 41 are used by setting light sources 28, 29 and light- receiving elements 32, 33 at proper intervals by the cell size of a memory cell 45 or 46 transmitted from a keyboard 43 and the matrix information of the cell, a sample base 27 is further moved and the memory cells 45 are compared mutually two by two, and a cell array section 47 or 48 is compared precisely by a pattern at high speed. Accordingly, the defect of the pattern can be inspected, thus extremely facilitating the collection of design data for inspection.</p>
申请公布号 JPS61216428(A) 申请公布日期 1986.09.26
申请号 JP19850057819 申请日期 1985.03.22
申请人 NEC CORP 发明人 NAKAMURA SHINICHI
分类号 G01B11/30;G01N21/88;G01N21/956;G03F1/00;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01B11/30
代理机构 代理人
主权项
地址