发明名称 METHOD OF SUPPLYING CHEMICAL FOR MANUFACTURE OF SEMICONDUCTOR
摘要 PURPOSE:To enable the temperature of chemical liquid within a chemical liquid supply tank to be controlled precisely at a temperature level predetermined for a treating process, by previously passing the chemical liquid through a heat exchanger for regulating the temperature thereof to a temperature level predetermined for the treating process while feeding the chemical liquid so as to keep the amount of liquid within the supply tank within a certain range. CONSTITUTION:Chemical liquid in a storage tank 1 is fed, via a heat exchanger 3, to a chemical liquid supply tank 4 having a temperature regulator and an automatic liquid-level controller 6. The chemical liquid whose temperature has been regulated to a predetermined value in the supply tank 4 is further fed to a chemical liquid treating process 5. The feeding of the chemical liquid to the supply tank is performed such that a liquid-feeding pump stops the feeding if the liquid-level controller 6 detects a higher liquid level and it feeds the chemical liquid if the controller detects a lower level. Accordingly, a little variance in temperature of the chemical liquid fed through the heat exchanged, if any, may be absorbed in the supply tank. Further, since the variance in amount of liquid within the supply tank is also within a certain range, the temperature of the chemical liquid can be regulated precisely within the supply tank.
申请公布号 JPS62183123(A) 申请公布日期 1987.08.11
申请号 JP19860023036 申请日期 1986.02.06
申请人 NIPPON ZEON CO LTD;FUJITSU LTD 发明人 MITSUHORI SHIYUUICHI;HORIKAWA MASAYUKI;KOMAI SHIGEHIRO;FUJIE NOBUO;OSHIDA YU;BABA HIROYUKI
分类号 B01J4/00;H01L21/306 主分类号 B01J4/00
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